38 US patent applications published on 28 December 2006 and assigned to Micron
| 1 | 20060292875 | Method for enhancing electrode surface area in DRAM cell capacitors |
| 2 | 20060292873 | Unsymmetrical ligand sources, reduced symmetry metal-containing compounds, and systems and methods including same |
| 3 | 20060292858 | Techniques to create low K ILD for beol |
| 4 | 20060292857 | METHODS FOR MAKING INTEGRATED-CIRCUIT WIRING FROM COPPER, SILVER, GOLD, AND OTHER METALS |
| 5 | 20060292841 | Atomic layer deposition systems and methods including metal beta-diketiminate compounds |
| 6 | 20060292838 | Ion implanting methods |
| 7 | 20060292788 | Systems and methods of forming refractory metal nitride layers using disilazanes |
| 8 | 20060292786 | Semiconductor constructions, and methods of forming semiconductor constructions |
| 9 | 20060292767 | STORAGE DEVICES FORMED ON PARTIALLY ISOLATED SEMICONDUCTOR SUBSTRATE ISLANDS |
| 10 | 20060292750 | Standoffs for centralizing internals in packaging process |
| 11 | 20060292746 | Stacked die in die BGA package |
| 12 | 20060292745 | Stacked die in die BGA package |
| 13 | 20060292743 | Stacked die in die BGA package |
| 14 | 20060292735 | Methods for creating gapless inner microlenses, arrays of microlenses, and imagers having same |
| 15 | 20060292303 | Beta-diketiminate ligand sources and metal-containing compounds thereof, and systems and methods including same |
| 16 | 20060291312 | CMOS amplifiers with frequency compensating capacitors |
| 17 | 20060291280 | Configuration finalization on first valid NAND command |
| 18 | 20060290438 | MICROSTRIP LINE DIELECTRIC OVERLAY |
| 19 | 20060290001 | Interconnect vias and associated methods of formation |
| 20 | 20060289993 | Barrier-metal-free copper damascene technology using atomic hydrogen enhanced reflow |
| 21 | 20060289992 | Stacked semiconductor component, fabrication method and fabrication system |
| 22 | 20060289990 | APPARATUS AND METHOD FOR HIGH DENSITY MULTI-CHIP STRUCTURES |
| 23 | 20060289989 | Intrinsic thermal enhancement for FBGA package |
| 24 | 20060289969 | LASER ASSISTED MATERIAL DEPOSITION |
| 25 | 20060289968 | Conductive interconnect structures and formation methods using supercritical fluids |
| 26 | 20060289956 | Process for creating tilted microlens |
| 27 | 20060289952 | Method of composite gate formation |
| 28 | 20060289951 | Method of composite gate formation |
| 29 | 20060289950 | Method of composite gate formation |
| 30 | 20060289949 | Method of composite gate formation |
| 31 | 20060289927 | Non-volatile memory with hole trapping barrier |
| 32 | 20060289923 | Oxide epitaxial isolation |
| 33 | 20060289918 | Low resistance peripheral local interconnect contacts with selective wet strip of titanium |
| 34 | 20060289914 | Semiconductor constructions, memory cells, DRAM arrays, electronic systems; methods of forming semiconductor constructions; and methods of forming DRAM arrays |
| 35 | 20060289902 | Method for forming raised structures by controlled selective epitaxial growth of facet using spacer |
| 36 | 20060289389 | Poly etch without separate oxide decap |
| 37 | 20060289033 | METHOD OF CLEANING SEMICONDUCTOR SURFACES |
| 38 | 20060288937 | LASER ASSISTED MATERIAL DEPOSITION |