22 US patents granted on 01 July 2008 and assigned to Micron
| 1 | 7,395,409 | Split embedded DRAM processor |
| 2 | 7,395,130 | Method and system for aggregating and combining manufacturing data for analysis |
| 3 | 7,394,699 | Sense amplifier for a non-volatile memory device |
| 4 | 7,394,693 | Multiple select gate architecture |
| 5 | 7,394,267 | Compliant contact pin assembly and card system |
| 6 | 7,394,157 | Integrated circuit and seed layers |
| 7 | 7,394,142 | Bulk-isolated PN diode and method of forming a bulk-isolated PN diode |
| 8 | 7,394,111 | Strained Si/SiGe structures by ion implantation |
| 9 | 7,394,056 | Image sensor having pinned floating diffusion diode |
| 10 | 7,393,798 | Resistance variable memory with temperature tolerant materials |
| 11 | 7,393,796 | Composite dielectric forming methods and composite dielectrics |
| 12 | 7,393,789 | Protective coating for planarization |
| 13 | 7,393,785 | Methods and apparatus for forming rhodium-containing layers |
| 14 | 7,393,783 | Methods of forming metal-containing structures |
| 15 | 7,393,770 | Backside method for fabricating semiconductor components with conductive interconnects |
| 16 | 7,393,753 | Method for forming a storage cell capacitor compatible with high dielectric constant materials |
| 17 | 7,393,743 | Methods of forming a plurality of capacitors |
| 18 | 7,393,741 | Methods of forming pluralities of capacitors |
| 19 | 7,393,736 | Atomic layer deposition of Zr.sub.x Hf.sub.y Sn.sub.1-x-y O.sub.2 films as high k gate dielectrics |
| 20 | 7,393,563 | Plasma enhanced chemical vapor deposition method of forming titanium silicide comprising layers |
| 21 | 7,393,562 | Deposition methods for improved delivery of metastable species |
| 22 | 7,392,584 | Methods and apparatus for a flexible circuit interposer |
