Micron patents granted on 31 October 2006

31 US patents granted on 31 October 2006 and assigned to Micron

1 7,130,979 Dynamic volume management
2 7,130,239 Memory system, method and predecoding circuit operable in different modes for selectively accessing multiple blocks of memory cells for simultaneous writing or erasure
3 7,130,228 Active termination control through module register
4 7,130,227 Adjustable timing circuit of an integrated circuit
5 7,130,226 Clock generating circuit with multiple modes of operation
6 7,130,220 Write once read only memory employing floating gates
7 7,130,216 One-device non-volatile random access memory cell
8 7,130,022 Methods and systems for controlling radiation beam characteristics for microlithographic processing
9 7,129,930 Cordless computer keyboard with illuminated keys
10 7,129,794 Phase detector for reducing noise
11 7,129,761 Digital delay-locked loop circuits with hierarchical delay adjustment
12 7,129,738 Method and apparatus for calibrating driver impedance
13 7,129,725 Semiconductor test interconnect with variable flexure contacts having polymer material
14 7,129,724 Plasma probe
15 7,129,631 Black matrix for flat panel field emission displays
16 7,129,584 Elimination of RDL using tape base flip chip on flex for die stacking
17 7,129,573 System having semiconductor component with encapsulated, bonded, interconnect contacts
18 7,129,567 Substrate, semiconductor die, multichip module, and system including a via structure comprising a plurality of conductive elements
19 7,129,553 Lanthanide oxide/hafnium oxide dielectrics
20 7,129,535 Capacitor constructions
21 7,129,534 Magneto-resistive memory and method of manufacturing the same
22 7,129,457 Redundant imaging systems
23 7,129,188 Transistor fabrication methods
24 7,129,180 Masking structure having multiple layers including an amorphous carbon layer
25 7,129,160 Method for simultaneously removing multiple conductive materials from microelectronic substrates
26 7,129,156 Method for fabricating a silicon carbide interconnect for semiconductor components using heating
27 7,129,128 Method of improved high K dielectric-polysilicon interface for CMOS devices
28 7,129,114 Methods relating to singulating semiconductor wafers and wafer scale assemblies
29 7,128,842 Polyimide as a mask in vapor hydrogen fluoride etching
30 7,128,787 Atomic layer deposition method
31 7,128,551 Surface smoothing of stereolithographically formed 3-D objects